Mask Aligner MA6

Mask Aligner MA6
Mask Aligner MA6

Manufacturer and model:

KARL SUSS MA/BA6 Mask Aligner.



The SUSS MA/BA6 mask aligner is widely recognized as a benchmark in semiconductor submicron research and microsystems production.


It is designed for all standard lithography applications and wafer sizes of up to 150 mm. For thick-resist MEMS applications, the MA/BA6 offers high resolution and optimum edge quality.


The bottom side alignment option allows for pattern printing on both sides of the substrate.



  • Flood exposure, soft, hard, and vacuum contact capable.
  • Topside and backside alignment.
  • 1 µm feature size. resolution in thin resist.
  • Chucks and mask holders in different sizes.
  • Processing of wafers or squares from 2" to 150mm.


Engineering Cleanroom, Wolfson building of Electrical Engineering.


Tool Owner:

Dr. Boris Yofis ( 


Tool Trainer:

Erez Benjamin (


Rates & Costs for external Commercial / Industrial:

Clean Room - 200 NIS / hr

Tool - 440 NIS / hr

Staff Time - 440 NIS / hr.

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