E-Beam Lithography Raith 150 Ⅱ
- Ultra-high-resolution Electron Beam Lithography.
- Automated waferscale e-beam writing.
- 30 KV exposure and imaging.
- Thermal shield.
- Unique split room setup.
- The RAITH150 two can expose structures smaller than 5 nm and works with sample sizes from a few mm up to 8-inch wafers.
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