Industry Pricelist


#	System	Industry
#	System	Tool NIS/hr	Staff NIS/hr	System Owner
Deposition
1	Ebeam evaporator VST (Nano)	480*	480	Sergio Bloch
2	Ebeam evaporator VST (GB)	480*	480	Sergio Bloch
3	Magnetron Sputtering Vinci	480*	480	Sergio Bloch
4	Magnetron Sputtering PENTA	480*	480	Sergio Bloch
5	Diode Sputtering MRC	480*	480	Gidon Jacob
6	Ebeam evaporator Vinci	480*	480	Sergio Bloch
7	PECVD PlasmTherm	480	480	Sergio Bloch
8	ALD Beneq	480	480	Inna Shekhtman
9	RTP	480	480	Nirit Porecki
10	Electroplating Yamamoto	480	480	Dr. Boris Yofis
Etch
11	RIE NEXTRAL	480	480	Dr. Valery Garber
12	RIE Oerlicon	480	480	Dr. Boris Yofis
13	Deep RIE Versaline DSE	480	480	Dr. Valery Garber
14	Ion Beam Milling AJA	480	480	Nirit Porecki
Micro-Machining
15	Femtosecond Laser ELAS	480	480	Roy Davidi
Lithography
16	E-Beam Lithography Raith 150-I	480*	480	Inna Shekhtman
17	E-Beam Lithography Raith 150-II	480*	480	Inna Shekhtman
18	Photolithography MA6/BA	480	480	Erez Binyamin
20	Nano Imprint Lithogrpahy	480	480	Nirit Porecki
21	Direct Laser Writer (wafer and mask) Heidelberg	480	480	Anastasiia Adelberg
Back End
22	Dicing Disco Saw	480	480	Raz Samira
23	ATV Vacuum Oven 301	260	480	Gidon Jacob
24	Ball Wire bonder	480	480	Roman Nudelman
25	Wedge Wire bonder	480	480	Roman Nudelman
26	I-V/C-V Meter Keithley	480	480	Anastasiia Adelberg
Characterization
27	Helius 5 Dual Beam FIB ThermoFisher	480**	480	Roy Davidi
28	HRSEM ZEISS Gemini 300	480	480	Dr. Pini Shekhter
29	XRD	550		Dr. David Levy
30	XPS/AES	880		Dr. Pini Shekhter
31	ESEM	840		Dr. Zahava Barkay
32	HRSEM Apreo Cathodoluminescence	coming soon (Q323)		Dr. Zahava Barkay
33	TOF/SIMS	960		Dr. Alexander Gladkikh
34	TEM (Talos F200i)	coming soon (Q323)		Dr. George Levi
35	TEM (SPECTRA)	coming soon (Q423)		Dr. George Levi
36	Profilometer KLA	260	480	Erez Binyamin
37	Profilometer DETAK	260	480	Dr. Boris Yofis
38	Ellipsometer Woollam	480	480	Sergio Bloch
39	UV-VIS-NIR Spectrometer Lamda 1050	480	480	Anastasia Adelberg
41	Confocal Microscope Olympus LEXT 4000	260	480	Erez Binyamin
42	FTIR spectrophotometer	400	480	Dr. Valery Garber
42	Contact Angle	260	480	Nicole Gorokhovsky
43	NanoDrop	260	480	Nicole Gorokhovsky
44	DLS (Zeta sizer/potential)	260	480	Nicole Gorokhovsky
45	AFM	Coming soon (Q323)	480	Anastasia Adelberg
46	Raman Spectroscopy	480	480	Anastasia Adelberg
Mask
47	File Design	N/A	480	Anastasia Adelberg
48	Mask Fabrication (Soda Lime substrate)	*details bellow		Anastasia Adelberg

* Industry
Size	HR	LR
4"	2,700	1,925
5"	3,900	2,550

Additional Information:

*EBL resist and metals deposition for additional fee per used quantity

** FIB consumable material might have additional fee, per specific cost

Minimum billing time: 30 minutes.
Clean room entrance fee 200 NIS
Glove Box room entrance fee 200 NIS
- Clean room entrance fees cover: CR gowning, chemical benches, photoresist, optical microscopies, plasma ashers, hot plates, and 4pp measurements
- EBL entrance fees cover: chemical benches, photoresist, optical microscopies, plasma ashers
- Glove Box room entrance fees cover: GB maintanance and operation (Liquid N2)
- Other equipment is charged per actual usege, in addition to clean room time.
- Mask price is based on substrate material area, mask patterned area, requested resolution and is fixed price for all masks with similar parameters
How to Become a Self-Operating User:
- Issue a blanket order for safety introduction and equipment training
- Safety introduction for self-operating users from industry and academia: 200 NIS
- Follow instructions on Nanocneter website: https://nano.tau.ac.il/mncf/Independent-users