Industry Pricelist


#	System	Industry
#	System	Tool NIS/hr		Staff NIS/hr	System Owner
Deposition
1	Ebeam Evaporator VST (Nano)	480*		480	Sergio Bloch
2	Ebeam Evaporator VST (GB)	480*		480	Sergio Bloch
3	Magnetron Sputtering Vinci	480*		480	Sergio Bloch
4	Magnetron Sputtering PENTA	480*		480	Sergio Bloch
6	Ebeam Evaporator Vinci	480*		480	Sergio Bloch
7	PECVD PlasmTherm	480		480	Sergio Bloch
8	ALD Beneq	480		480	Inna Shekhtman
9	RTP	480		480	Nirit Porecki
10	Electroplating Yamamoto	480		480	Dr. Boris Yofis
Etch
11	RIE NEXTRAL	480		480	Erez Benjamin
12	RIE Oerlicon	480		480	Dr. Boris Yofis
13	Deep RIE Versaline DSE	480		480	Erez Benjamin
14	Ion Beam Milling AJA	480		480	Nirit Porecki
Micro-Machining
15	Femtosecond Laser ELAS	480		480	Dr. Anastasia Adelberg
Lithography
16	E-Beam Lithography Raith 150-I	480*		480	Inna Shekhtman
17	E-Beam Lithography Raith 150-II	480*		480	Inna Shekhtman
18	Photolithography MA6/BA	480		480	Erez Benjamin
20	Nano Imprint Lithogrpahy	480		480	Nirit Porecki
21	Direct Laser Writer (wafer and mask) Heidelberg	480		480	Dr. Anastasia Adelberg
Back End
22	Dicing Disco Saw	480		480	Bar Favelukis
23	ATV Vacuum Oven 301	260		480	Gidon Jacob
24	Ball Wire Bonder	480		480	Bar Favelukis
25	Wedge Wire bonder	480		480	Bar Favelukis
Fabrication Metrology
26	Profilometer KLA	260		480	Erez Benjamin
27	Profilometer DETAK	260		480	Dr. Boris Yofis
28	I-V/C-V Meter Keithley 4210	480		480	Dr. Anastasia Adelberg
29	Ellipsometer Woollam	480		480	Sergio Bloch
Ion & Electron Microscopy
30	Helius 5 Dual Beam FIB ThermoFisher	480**		480	Dr. Alex Lahav
31	HRSEM ZEISS Gemini 300	480		480	Dr. Pini Shekhter
32	ESEM	840			Dr. Zahava Barkay
33	HRSEM Apreo Cathodoluminescence	960			Dr. Zahava Barkay
34	TEM Talos F200i	610	270		Dr. George Levi
35	TEM (SPECTRA)	coming soon (Q423)			Dr. George Levi
Material Analysis
36	XRD	550			Dr. David Levy
37	XPS/AES	880			Dr. Pini Shekhter
38	TOF/SIMS	960			Dr. Alexander Gladkikh
39	UV-VIS-NIR Spectrometer Lamda 1050	480		480	Dr. David Levy
40	FTIR Spectrophotometer	400		480	Dr. David Levy
41	Contact Angle	260		480	Nicole Gorokhovsky
42	NanoDrop	260		480	Nicole Gorokhovsky
43	DLS (Zeta sizer/potential)	260		480	Nicole Gorokhovsky
44	AFM	Coming soon (Q323)		480	Anastasia Adelberg
45	Raman Spectroscopy	480		480	Anastasia Adelberg
Mask
46	File Design	N/A		480	Anastasia Adelberg
47	Mask Fabrication (Soda Lime substrate)	*details bellow			Anastasia Adelberg

* Industry
Size	HR	LR
4"	2,700	1,925
5"	3,900	2,550

Additional Information:

*EBL resist and metals deposition for additional fee per used quantity

** FIB consumable material might have additional fee, per specific cost

Minimum billing time: 30 minutes.
Clean room entrance fee 200 NIS
Glove Box room entrance fee 200 NIS
- Clean room entrance fees cover: CR gowning, chemical benches, photoresist, optical microscopies, plasma ashers, hot plates, and 4pp measurements
- EBL entrance fees cover: chemical benches, photoresist, optical microscopies, plasma ashers
- Glove Box room entrance fees cover: GB maintanance and operation (Liquid N2)
- Other equipment is charged per actual usege, in addition to clean room time.
- Mask price is based on substrate material area, mask patterned area, requested resolution and is fixed price for all masks with similar parameters
How to Become a Self-Operating User:
- Issue a blanket order for safety introduction and equipment training
- Safety introduction for self-operating users from industry and academia: 200 NIS
- Follow instructions on Nanocneter website: https://nano.tau.ac.il/mncf/Independent-users