Industry Pricelist

 

#

System

 

Industry

 

Tool  NIS/hr

Staff  NIS/hr

System Owner

Deposition

1

Ebeam evaporator VST (Nano) 440* 440 Nirit Porecki

2

Ebeam evaporator VST (GB) 440* 440 Nirit Porecki

3

Magnetron Sputtering Vinci 440* 440 Sergio Bloch

4

Magnetron Sputtering PENTA 440* 440 Sergio Bloch

5

Diode Sputtering MRC

440*

440 Gidon Jacob

6

Ebeam evaporator Vinci 

440* 440 Nirit Porecki

7

PECVD PlasmTherm

440 440 Sergio Bloch

8

ALD Beneq

440 440 Inna Shekhtman

9

RTP

440 440 Nirit Porecki

10

Electroplating Yamamoto

440 440 Inna Shekhtman

Etch

11

RIE NEXTRAL 440 440 Dr. Valery Garber

12

RIE Oerlicon

440 440 Dr. Boris Yofis

13

Deep RIE Versaline DSE

440 440 Dr. Valery Garber

14

Ion Beam Milling AJA 

440 440 Nirit Porecki

Micro-Machining

15

Femtosecond Laser ELAS

440 440 Roy Davidi

Lithography

16 E-Beam Lithography Raith 150-I 440* 440

Inna Shekhtman

17

E-Beam Lithography Raith 150-II

440* 440 Inna Shekhtman
18

Photolithography MA6

440 440 Dr. Boris Yofis
19

Photolithography MJB3

440 440 Dr. Boris Yofis
20

Nano Imprint Lithogrpahy

440 440 Nirit Porecki
21

Direct Laser Writer (wafer and mask) Heidelberg

440 440 Anastasiia Adelberg

Back End

22

Dicing Disco Saw

440 440 Raz Samira
23

ATV Vacuum Oven 301

220 240 Gidon Jacob
24

Ball Wire bonder

440 440 Roman Nudelman
25

Wedge Wire bonder

440 440 Roman Nudelman
26 KEITHLEY E-TEST 440 440

Anastasiia Adelberg

Characterization

27

Helius 5 Dual Beam FIB ThermoFisher

440 440 Roy Davidi
28 HRSEM ZEISS Gemini 300 440 440

Dr. Gal Radovsky

29

XRD

500 Dr. David Levy
30

XPS/AES

800 Dr. Pini Shekhter
31

ESEM

840 Dr. Zahava Barkay
32 TOF/SIMS

880

Dr. Alexander Gladkikh
33

TEM F20

560 Dr. George Levi
34

S/TEM JEOL JEM-2010F

560 Dr. George Levi
35

Profilometer KLA

240 440 Erez Binyamin
36

Profilometer DETAK

240 440 Erez Binyamin
37

Ellipsometer Woollam

440 440 Dr. Gal Radovsky
38 UV-VIS-NIR Spectrometer Lamda 1050 440 440

Dr. Gal Radovsky

39

FTIR spectrometer Bruker

360 440 Dr. Gal Radovsky
40

Confocal Microscope Olympus LEXT 4000

240 440 Erez Binyamin
41

Contact Angle

240 440 Roman Nudelman
42

NanoDrop

240 440 Roman Nudelman
43

DLS (Zeta sizer/potential)

240 440 Roman Nudelman
44

AFM

440* 440 Dr. Gal Radovsky
45

Raman Spectroscopy

440 440 Dr. Gal Radovsky

Mask

46

File Design

N/A 440 Anastasiia Adelberg
47

Mask Fabrication (Soda Lime substrate)

*details bellow Anastasiia Adelberg

 

* Industry

Size

HR

LR

4" 2,450 1,750
5" 3,550 2,319

 

Additional Information:

*EBL resist and metals deposition for additional fee per used quantity

  • Minimum billing time: 30 minutes.
  • Clean room entrance fee 200 NIS
  • Glove Box room entrance fee 200 NIS
    • Clean room entrance fees cover: CR gowning, chemical benches, photoresist, optical microscopies, plasma ashers, hot plates, and 4pp measurements
    • EBL entrance fees cover: chemical benches, photoresist, optical microscopies, plasma ashers
    • Glove Box room entrance fees cover: GB maintanance and operation (Liquid N2)
    • Other equipment  is charged per actual usege, in addition to clean room time.
    • Mask price is based on substrate material area, mask patterned area, requested resolution and is fixed price for all masks with similar parameters
       
  • How to Become a Self-Operating User:
    • Issue a blanket order for safety introduction and equipment training
    • Safety introduction for self-operating users from industry and academia: 200 NIS
    • Follow instructions on Nanocneter website: https://nano.tau.ac.il/mncf/Independent-users
 
Tel Aviv University makes every effort to respect copyright. If you own copyright to the content contained
here and / or the use of such content is in your opinion infringing, Contact us as soon as possible >>