Industry Pricelist


#	System	Industry
#	System	Tool NIS/hr	Staff NIS/hr	System Owner
Deposition
1	Ebeam Evaporator VST (Nano)	480*	480	Nirit Porecki
2	Magnetron Sputtering Vinci	480*	480	Nirit Porecki
3	Magnetron Sputtering PENTA	480*	480	Erez Benjamin
4	Ebeam Evaporator Vinci	480*	480	Nirit Porecki
5	PECVD PlasmTherm	480	480	Erez Benjamin
6	ALD Beneq	480	480	Inna Shekhtman
7	RTP	480	480	Nirit Porecki
8	Electroplating Yamamoto	480	480	Dr. Boris Yofis
Etch
9	RIE Oerlicon	480	480	Dr. Boris Yofis
10	Deep RIE Versaline DSE	480	480	Erez Benjamin
11	Ion Beam Milling AJA	480	480	Nirit Porecki
Micro-Machining
12	Femtosecond Laser ELAS	480	480	Dr. Anastasia Adelberg
Lithography
13	E-Beam Lithography Raith 150-II	480*	480	Inna Shekhtman
14	Photolithography MA6/BA	480	480	Erez Benjamin
15	Direct Laser Writer (wafer and mask) Heidelberg	480	480	Inna Shekhtman
Back End
16	Dicing Disco Saw	480	480	Bar Favelukis
17	ATV Vacuum Oven 301	260	480	Gidon Jacob
18	Ball bonder	260	480	Gidon Jacob
Fabrication Metrology
19	Profilometer KLA	260	480	Erez Benjamin
20	Profilometer DETAK	260	480	Dr. Boris Yofis
21	Confocal Microscope Olympus LEXT 5100	260	480	Erez Benjamin
22	I-V/C-V Meter Keithley 4210	480	480	Dr. Anastasia Adelberg
23	Ellipsometer Woollam	480	480	Inna Shekhtman
24	Raman Spectroscopy	380	480	Dr. Anastasia Adelberg
Ion & Electron Microscopy
25	Helius 5 Dual Beam FIB ThermoFisher	480**	480	Dr. Alex Lahav
26	HRSEM ZEISS Gemini 300	480	480	Dr. Pini Shekhter
27	ESEM	840		Dr. Zahava Barkay
28	HRSEM Apreo Cathodoluminescence	960		Dr. Zahava Barkay
29	Talos F200i S/TEM	880		Dr. George Levi
30	SPECTRA 200 S/TEM	1200		Dr. George Levi
Material Analysis
31	XRD	550		Dr. David Levy
32	XPS/AES	880		Dr. Pini Shekhter
33	TOF/SIMS	1100		Dr. Alexander Gladkikh
34	UV-VIS-NIR Spectrometer Lambda 1050	480	480	Dr. David Levy
35	FTIR Spectrophotometer	400	480	Dr. David Levy
36	Contact Angle	260	480	Nicole Gorokhovsky
37	DLS (Zeta sizer/potential)	260	480	Nicole Gorokhovsky
38	AFM Parks NX10	360	480	Anastasia Adelberg
39	AFM Parks NX12	360	480	Anastasia Adelberg
Mask
40	File Design	N/A	480	Inna Shekhtman
41	Mask Fabrication (Soda Lime substrate)	*details bellow		Inna Shekhtman

* Industry
Size	HR	LR
4"	2,700	1,925
5"	3,900	2,550

Additional Information:

*EBL resist and metals deposition for additional fee per used quantity

** FIB consumable material might have additional fee, per specific cost

Minimum billing time: 30 minutes.
Clean room entrance fee 200 NIS
Glove Box room entrance fee 200 NIS
- Clean room entrance fees cover: CR gowning, chemical benches, photoresist, optical microscopies, plasma ashers, hot plates, and 4pp measurements
- EBL entrance fees cover: chemical benches, photoresist, optical microscopies, plasma ashers
- Glove Box room entrance fees cover: GB maintanance and operation (Liquid N2)
- Other equipment is charged per actual usege, in addition to clean room time.
- Mask price is based on substrate material area, mask patterned area, requested resolution and is fixed price for all masks with similar parameters
How to Become a Self-Operating User:
- Issue a blanket order for safety introduction and equipment training
- Safety introduction for self-operating users from industry and academia: 200 NIS
- Follow instructions on Nanocneter website: https://nano.tau.ac.il/mncf/new-user