Industry Pricelist

 

#

System

 

Industry

 

Tool  NIS/hr

Staff  NIS/hr

System Owner

Deposition

1

Ebeam Evaporator VST (Nano) 480* 480 Nirit Porecki

2

Magnetron Sputtering Vinci 480* 480 Nirit Porecki

3

Magnetron Sputtering PENTA 480* 480 Valery Garber

4

Ebeam Evaporator Vinci 

480* 480 Nirit Porecki

5

PECVD PlasmTherm

480 480

Dr. Gregory Kopnov

6

ALD Beneq

480 480 Dr. Gregory Kopnov

7

RTP

480 480 Nirit Porecki

8

Electroplating Yamamoto

480 480 Dr. Boris Yofis

Etch

9

RIE Oerlicon

480 480 Dr. Boris Yofis

10

Deep RIE Versaline DSE

480 480 Erez Benjamin

11

Ion Beam Milling AJA 

480 480 Nirit Porecki

Micro-Machining

12

Femtosecond Laser ELAS

480 480 Dr. Anastasia Adelberg

Lithography

13 E-Beam Lithography Raith 150-I 480* 480

Inna Shekhtman

14

E-Beam Lithography Raith 150-II

480* 480 Inna Shekhtman
15

Photolithography MA6/BA

480 480 Erez Benjamin
16

Direct Laser Writer (wafer and mask) Heidelberg

480 480 Dr. Anastasia Adelberg

Back End

17

Dicing Disco Saw

480 480 Bar Favelukis
18

ATV Vacuum Oven 301

260 480 Gidon Jacob

Fabrication Metrology

19

Profilometer KLA

260 480 Erez Benjamin
20

Profilometer DETAK

260 480 Dr. Boris Yofis
21 Confocal Microscope Olympus LEXT 5100 260 480 Erez Benjamin
22

I-V/C-V Meter Keithley 4210

480 480 Dr. Anastasia Adelberg
23

Ellipsometer Woollam

480 480 Dr. Gregory Kopnov

Ion & Electron Microscopy

24

Helius 5 Dual Beam FIB ThermoFisher

480** 480 Dr. Alex Lahav
25

HRSEM ZEISS Gemini 300

480 480 Dr. Pini Shekhter
26

ESEM

840 Dr. Zahava Barkay
27

HRSEM Apreo Cathodoluminescence 

960 Dr. Zahava Barkay
28

TEM Talos F200i

880 Dr. George Levi
29 TEM SPECTRA 1200 Dr. George Levi

Material Analysis

30

XRD

550 Dr. David Levy
31

XPS/AES

880 Dr. Pini Shekhter
32 TOF/SIMS

1100

Dr. Alexander Gladkikh
33 UV-VIS-NIR Spectrometer Lambda 1050 480 480 Dr. David Levy
34 FTIR Spectrophotometer 400 480 Dr. David Levy
35

Contact Angle

260 480 Nicole Gorokhovsky
36

NanoDrop

260 480 Nicole Gorokhovsky
37

DLS (Zeta sizer/potential)

260 480 Nicole Gorokhovsky
38

AFM Parks NX10

480 480 Anastasia Adelberg
39

AFM Parks NX12

480 480 Anastasia Adelberg

Mask

40

File Design

N/A 480 Inna Shekhtman
41

Mask Fabrication (Soda Lime substrate)

*details bellow Inna Shekhtman

 

* Industry

Size

HR

LR

4" 2,700 1,925
5" 3,900 2,550

 

Additional Information:

*EBL resist and metals deposition for additional fee per used quantity

** FIB consumable material might have additional fee, per specific cost
 

  • Minimum billing time: 30 minutes.
  • Clean room entrance fee 200 NIS
  • Glove Box room entrance fee 200 NIS
    • Clean room entrance fees cover: CR gowning, chemical benches, photoresist, optical microscopies, plasma ashers, hot plates, and 4pp measurements
    • EBL entrance fees cover: chemical benches, photoresist, optical microscopies, plasma ashers
    • Glove Box room entrance fees cover: GB maintanance and operation (Liquid N2)
    • Other equipment  is charged per actual usege, in addition to clean room time.
    • Mask price is based on substrate material area, mask patterned area, requested resolution and is fixed price for all masks with similar parameters
       
  • How to Become a Self-Operating User:
    • Issue a blanket order for safety introduction and equipment training
    • Safety introduction for self-operating users from industry and academia: 200 NIS
    • Follow instructions on Nanocneter website: https://nano.tau.ac.il/mncf/new-user
 
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