Industry Pricelist

 

#

System

 

Industry

 

Tool  NIS/hr

Staff  NIS/hr

System Owner

Deposition

1

Ebeam Evaporator BAK501 1400* 480 Nirit Porecki

2

Ebeam Evaporator VST (Nano) 480* 480 Nirit Porecki

3

Magnetron Sputtering Vinci 480* 480 Nirit Porecki

4

Magnetron Sputtering PENTA 480* 480 Erez Benjamin

5

Ebeam Evaporator Vinci 

480* 480 Nirit Porecki

6

PECVD PlasmTherm

480 480 Erez Benjamin

7

ALD Beneq

480 480 Inna Shekhtman

8

RTP

480 480 Nirit Porecki

9

Electroplating Yamamoto

480 480 Erez Benjamin

Etch

10

RIE Oerlicon

480 480 Erez Benjamin

11

Deep RIE Versaline DSE

480 480 Erez Benjamin

12

Ion Beam Milling AJA 

480 480 Nirit Porecki

Micro-Machining

13

Femtosecond Laser ELAS

480 480 Dr. Anastasia Adelberg

Lithography

14

E-Beam Lithography Raith 150-II

480* 480 Inna Shekhtman
15

Photolithography MA6/BA

480 480 Erez Benjamin
16

Direct Laser Writer (wafer and mask) Heidelberg

480 480 Inna Shekhtman

Back End

17

Dicing Disco Saw

480 480 Bar Favelukis
18

ATV Vacuum Oven 301

260 480 Gidon Jacob
19 Ball bonder 260 480 Gidon Jacob
20 CPD 480 480 Inna Shekhtman

Fabrication Metrology

21

Profilometer KLA

260 480 Erez Benjamin
22

Profilometer DETAK

260 480 Nirit Porecki
23 Confocal Microscope Olympus LEXT 5100 260 480 Erez Benjamin
24

I-V/C-V Meter Keithley 4210

480 480 Dr. Anastasia Adelberg
25

Ellipsometer Woollam

480 480 Inna Shekhtman
26

Raman Spectroscopy

380 480 Dr. Anastasia Adelberg

Ion & Electron Microscopy

27

Helius 5 Dual Beam FIB ThermoFisher

480** 480 Dr. Alex Lahav
28

HRSEM ZEISS Gemini 300

480 480 Maria Tkachev
29

ESEM

840 Dr. Zahava Barkay
30

HRSEM Apreo Cathodoluminescence 

960 Dr. Zahava Barkay
31

Talos F200i S/TEM

880 Dr. George Levi
32 SPECTRA 200 S/TEM 1200 Dr. George Levi

Material Analysis

33

XRD

550 Dr. David Levy
34

XPS/AES

880 Dr. Pini Shekhter
35 UV-VIS-NIR Spectrometer Lambda 1050 480 480 Dr. David Levy
36 FTIR Spectrophotometer 400 480 Dr. David Levy
37

Contact Angle

260 480 Nicole Gorokhovsky
38

DLS (Zeta sizer/potential)

260 480 Nicole Gorokhovsky
39

AFM Parks NX10

360 480 Anastasia Adelberg
40

AFM Parks NX12

360 480 Anastasia Adelberg

Mask

41

File Design

N/A 480 Inna Shekhtman
42

Mask Fabrication (Soda Lime substrate)

*details bellow Inna Shekhtman

 

* Industry

Size

HR

LR

4" 2,700 1,925
5" 3,900 2,550

 

Additional Information:

*EBL resist and metals deposition for additional fee per used quantity

** FIB consumable material might have additional fee, per specific cost
 

  • Minimum billing time: 30 minutes.
  • Clean room entrance fee 200 NIS
  • Glove Box room entrance fee 200 NIS
    • Clean room entrance fees cover: CR gowning, chemical benches, photoresist, optical microscopies, plasma ashers, hot plates, and 4pp measurements
    • EBL entrance fees cover: chemical benches, photoresist, optical microscopies, plasma ashers
    • Glove Box room entrance fees cover: GB maintanance and operation (Liquid N2)
    • Other equipment  is charged per actual usege, in addition to clean room time.
    • Mask price is based on substrate material area, mask patterned area, requested resolution and is fixed price for all masks with similar parameters
       
  • How to Become a Self-Operating User:
    • Issue a blanket order for safety introduction and equipment training
    • Safety introduction for self-operating users from industry and academia: 200 NIS
    • Follow instructions on Nanocneter website: https://nano.tau.ac.il/mncf/new-user
 
Tel Aviv University makes every effort to respect copyright. If you own copyright to the content contained
here and / or the use of such content is in your opinion infringing Contact the referral system >>