Industry Pricelist


#	System	Industry
#	System	Tool NIS/hr	Staff NIS/hr	System Owner
Deposition
1	Ebeam Evaporator VST (Nano)	480*	480	Nirit Porecki
2	Magnetron Sputtering Vinci	480*	480	Nirit Porecki
3	Magnetron Sputtering PENTA	480*	480	Valery Garber
4	Ebeam Evaporator Vinci	480*	480	Nirit Porecki
5	PECVD PlasmTherm	480	480	Dr. Gregory Kopnov
6	ALD Beneq	480	480	Dr. Gregory Kopnov
7	RTP	480	480	Nirit Porecki
8	Electroplating Yamamoto	480	480	Dr. Boris Yofis
Etch
9	RIE Oerlicon	480	480	Dr. Boris Yofis
10	Deep RIE Versaline DSE	480	480	Erez Benjamin
11	Ion Beam Milling AJA	480	480	Nirit Porecki
Micro-Machining
12	Femtosecond Laser ELAS	480	480	Dr. Anastasia Adelberg
Lithography
13	E-Beam Lithography Raith 150-I	480*	480	Inna Shekhtman
14	E-Beam Lithography Raith 150-II	480*	480	Inna Shekhtman
15	Photolithography MA6/BA	480	480	Erez Benjamin
16	Direct Laser Writer (wafer and mask) Heidelberg	480	480	Dr. Anastasia Adelberg
Back End
17	Dicing Disco Saw	480	480	Bar Favelukis
18	ATV Vacuum Oven 301	260	480	Gidon Jacob
Fabrication Metrology
19	Profilometer KLA	260	480	Erez Benjamin
20	Profilometer DETAK	260	480	Dr. Boris Yofis
21	Confocal Microscope Olympus LEXT 5100	260	480	Erez Benjamin
22	I-V/C-V Meter Keithley 4210	480	480	Dr. Anastasia Adelberg
23	Ellipsometer Woollam	480	480	Dr. Gregory Kopnov
Ion & Electron Microscopy
24	Helius 5 Dual Beam FIB ThermoFisher	480**	480	Dr. Alex Lahav
25	HRSEM ZEISS Gemini 300	480	480	Dr. Pini Shekhter
26	ESEM	840		Dr. Zahava Barkay
27	HRSEM Apreo Cathodoluminescence	960		Dr. Zahava Barkay
28	TEM Talos F200i	880		Dr. George Levi
29	TEM SPECTRA	1200		Dr. George Levi
Material Analysis
30	XRD	550		Dr. David Levy
31	XPS/AES	880		Dr. Pini Shekhter
32	TOF/SIMS	1100		Dr. Alexander Gladkikh
33	UV-VIS-NIR Spectrometer Lambda 1050	480	480	Dr. David Levy
34	FTIR Spectrophotometer	400	480	Dr. David Levy
35	Contact Angle	260	480	Nicole Gorokhovsky
36	NanoDrop	260	480	Nicole Gorokhovsky
37	DLS (Zeta sizer/potential)	260	480	Nicole Gorokhovsky
38	AFM Parks NX10	480	480	Anastasia Adelberg
39	AFM Parks NX12	480	480	Anastasia Adelberg
Mask
40	File Design	N/A	480	Inna Shekhtman
41	Mask Fabrication (Soda Lime substrate)	*details bellow		Inna Shekhtman

* Industry
Size	HR	LR
4"	2,700	1,925
5"	3,900	2,550

Additional Information:

*EBL resist and metals deposition for additional fee per used quantity

** FIB consumable material might have additional fee, per specific cost

Minimum billing time: 30 minutes.
Clean room entrance fee 200 NIS
Glove Box room entrance fee 200 NIS
- Clean room entrance fees cover: CR gowning, chemical benches, photoresist, optical microscopies, plasma ashers, hot plates, and 4pp measurements
- EBL entrance fees cover: chemical benches, photoresist, optical microscopies, plasma ashers
- Glove Box room entrance fees cover: GB maintanance and operation (Liquid N2)
- Other equipment is charged per actual usege, in addition to clean room time.
- Mask price is based on substrate material area, mask patterned area, requested resolution and is fixed price for all masks with similar parameters
How to Become a Self-Operating User:
- Issue a blanket order for safety introduction and equipment training
- Safety introduction for self-operating users from industry and academia: 200 NIS
- Follow instructions on Nanocneter website: https://nano.tau.ac.il/mncf/new-user