Magnetron Sputtering Vinci

Manufacturer and model:

VINCI TECHNOLOGIES PVD 20.

Description:

Nearly all materials can be deposited by magnetron sputtering regardless of their melting temperature.

Materials: 

Au, Ag, Al, Cr, Cu, In, Ni, Mo, Si-intr, Ta, Ti, Al2O3, BN, ITO, Ni:Cr(80:20), SiC, SiO2, SiNx, TiN, TiO2. 

Specification:

• Up to 6‘’ wafers.
• Load lock with Ar plasma preclean. 
• 5 heads (1RF/4DC).
• Heating up to 350˚C.

​Location:

Nano center building.

Tool Owner:

Sergio Bloch (csebta@tauex.tau.ac.il).

Tool Trainer:

Dolev Roitman (rdolev@gmail.com).