Magnetron Sputtering PENTA

Manufacturer and model:

Magnetron Sputtering PENTA.

Description:

Physical vapor deposition by plasma-based deposition In which positively charged ions from the plasma are accelerated toward target by an electrical field.

Magnetron Sputtering systems for both dielectric (RF magnetron) and metallic materials (DC magnetron).

Materials: 

Au, Ag, Al, Cr, Cu, In, Ni, Mo, Si-intr, Ta, Ti, Al2O3, ITO, Ni:Cr(80:20), SiC, SiO2, SiNx, TiN, TiO2.