Magnetron Sputtering PENTA

Manufacturer and model:

Magnetron Sputtering PENTA.

Description:

The Magnetron Sputtering PENTA is a physical vapor deposition system utilizing plasma-based deposition, in which positively charged ions from the plasma are accelerated toward the target by an electrical field.

This advanced physical vapor deposition tool is designed for both dielectric (RF magnetron) and metallic materials (DC magnetron), ensuring versatility and high-quality thin-film deposition.

Materials: 

Au, Ag, Al, Cr, Cu, In, Ni, Mo, Si-intr, Ta, Ti, Al2O3, ITO, Ni:Cr(80:20), SiC, SiO2, SiNx, TiN, TiO2.