E-beam Evaporator Vinci

E-beam Evaporator Vinci
E-beam Evaporator Vinci

Manufacturer and model:

VINCI TECHNOLOGIES PVD 20.

 

Description:

Electron beam evaporation is available on a variety of platforms suitable for many applications, including metallization, dielectric coating and optical coating.

 

Materials: 

Au, Ag, Al, Co, Cr, Cu, In, Nb, Ni, Mo, Pd, Pt, Sn, Ta, Ti, W, Al203. 

 

Specification:

  • Up to 6‘’ wafers.
  • Load lock.
  • In situ Ar plasma preclean.
  • Base pressure E-8 Torr.
  • Heating up to 350˚C.
  • Typical deposition rate: 0.5 Å/sec.


Location:

Engineering Cleanroom, Wolfson building of Electrical Engineering.

 

Tool Owner:

Nirit Porecki-Shamay (nporecki@tauex.tau.ac.il)

 

Tool Trainer:

Dolev Roitman (rdolev@gmail.com)

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