E-beam Evaporator Vinci

Manufacturer and model:

VINCI TECHNOLOGIES PVD 20.

Description:

Electron beam evaporation is available on a variety of platforms suitable for many applications, including metallization, dielectric coating and optical coating.

Materials: 

Au, Ag, Al, Co, Cr, Cu, In, Nb, Ni, Mo, Pd, Pt, Sn, Ta, Ti, W, Al203. 

Specification:

• Up to 6‘’ wafers.
• Load lock.
• In situ Ar plasma preclean.
• Base pressure E-8 Torr.
• Heating up to 350˚C.
• Typical deposition rate: 0.5 Å/sec.

​Location:

Engineering Cleanroom, Wolfson building of Electrical Engineering.

Tool Owner:

Nirit Porecki-Shamay (nporecki@tauex.tau.ac.il)

Tool Trainer:

Dolev Roitman (rdolev@gmail.com)