E-beam Evaporator Vinci
Manufacturer and model:
VINCI TECHNOLOGIES PVD 20.
Description:
Electron beam evaporation is available on a variety of platforms suitable for many applications, including metallization, dielectric coating and optical coating.
Materials:
Au, Ag, Al, Co, Cr, Cu, In, Nb, Ni, Mo, Pd, Pt, Sn, Ta, Ti, W, Al203.
Specification:
- Up to 6‘’ wafers.
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Load lock.
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In situ Ar plasma preclean.
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Base pressure E-8 Torr.
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Heating up to 350˚C.
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Typical deposition rate: 0.5 Å/sec.
Location:
Engineering Cleanroom, Wolfson building of Electrical Engineering.
Tool Owner:
Nirit Porecki-Shamay (nporecki@tauex.tau.ac.il)
Tool Trainer:
Dolev Roitman (rdolev@gmail.com)