E-beam Evaporator Vinci
Manufacturer and model:
VINCI TECHNOLOGIES PVD 20.
Electron beam evaporation is available on a variety of platforms suitable for many applications, including metallization, dielectric coating and optical coating.
Au, Ag, Al, Co, Cr, Cu, In, Nb, Ni, Mo, Pd, Pt, Sn, Ta, Ti, W, Al203.
- Up to 6‘’ wafers.
In situ Ar plasma preclean.
Base pressure E-8 Torr.
Heating up to 350˚C.
Typical deposition rate: 0.5 Å/sec.
Engineering Cleanroom, Wolfson building of Electrical Engineering.
Nirit Porecki-Shamay (firstname.lastname@example.org)
Dolev Roitman (email@example.com)