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E-beam Evaporator Vinci
E-beam Evaporator Vinci
Description
Specification
Location & Tool Owner
Up to 6‘’ wafers.
Load lock.
In situ Ar plasma preclean.
Base pressure E-8 Torr.
Heating up to 350˚C.
Typical deposition rate: 0.5 Å/sec.
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E-beam Evaporator VST (Nano)
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