RTP

Manufacturer and model:

JIPELEC JETFIRST 100C.

Description:

Rapid Thermal Processing is a rapid heating process of a single wafer using lamp base heating for a short time, in order to affect its electrical properties.

Specification:

• Base pressure is 10-6 Torr.
• Gases: N2, O2, Ar and Forming Gas.
• Max temperature is 1100oC.
• Minimum pulse width: 1s. 

​Location:

Engineering Cleanroom, Wolfson Building of Electrical Engineering​.

Tool Owner:

Nirit Porecki-Shamay (nporecki@tauex.tau.ac.il).

Tool Trainer:

Nirit Porecki-Shamay (nporecki@tauex.tau.ac.il).