RTP

RTP
RTP

Manufacturer and model:

JIPELEC JETFIRST 100C.

 

Description:

Rapid Thermal Processing is a rapid heating process of a single wafer using lamp base heating for a short time, in order to affect its electrical properties.

 

Specification:

  • Base pressure is 10-6 Torr.
  • Gases: N2, O2, Ar and Forming Gas.
  • Max temperature is 1100oC.
  • Minimum pulse width: 1s. 


Location:

Engineering Cleanroom, Wolfson Building of Electrical Engineering​.

 

Tool Owner:

Nirit Porecki-Shamay (nporecki@tauex.tau.ac.il).

 

Tool Trainer:

Nofar Livni (nofarlivni@mail.tau.ac.il).

 

Rates & Costs for external Commercial / Industrial:

Clean Room - 200 NIS / hr.

Tool - 440 NIS / hr.

Staff Time - 440 NIS / hr.

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