PECVD PlasmTherm

Manufacturer and model:

Plasma Enhanced CVD - PlasmaTh SLR790.

Description:

The PlasmaTherm SLR790 is a high-performance PECVD system designed for plasma-enhanced chemical vapor deposition (PECVD) of high-quality thin films. This advanced PECVD tool enables the deposition of low-stress silicon nitride, silicon dioxide, and silicon oxynitride films with excellent uniformity and adhesion.

Utilizing plasma enhancement, this CVD tool allows for lower-temperature processing compared to conventional methods, making it an ideal CVD system for  applications in microelectronics, MEMS fabrication, and advanced material research. Its precise control over film properties ensures reliability and repeatability for a wide range of industrial and research applications.

Materials: 

SiO2 and SiNx.