PECVD PlasmTherm

Manufacturer and model:

Plasma Enhanced CVD - PlasmaTh SLR790.

Description:

The PlasmaTherm SLR790 is a high-performance PECVD machine designed for plasma-enhanced chemical vapor deposition (PECVD) of high-quality thin films. This advanced PECVD system enables the deposition of low-stress silicon nitride, silicon dioxide, and silicon oxynitride films with excellent uniformity and adhesion.

Utilizing plasma enhancement, this PECVD tool allows for lower-temperature processing compared to conventional CVD methods, making it ideal for applications in microelectronics, MEMS fabrication, and advanced material research. Its precise control over film properties ensures reliability and repeatability for a wide range of industrial and research applications.

Materials: 

SiO2 and SiNx.