ALD Beneq

ALD Beneq
ALD Beneq
  • Description
  • Specification
  • Location & Tool Owner


Manufacturer and model:




Atomic layer deposition is a chemical gas phase thin film deposition method based on sequential, self-saturating surface reactions. Using ALD, compared to sputter or evaporation, enables ultra fine thickness-controlled growth of the desired material by alternatively pulsing the source gases.

For growth of thin conformal layers with thickness control down to atomic precision (~ 3Å).



Pt, AlN, Al2O3, TaN, TiN, ZnO, TiO2, Ta2O5, HfO2 .

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