E-Beam Lithography Raith 150 Ⅱ

Manufacturer and model:

RAITH150 TWO Nanofabrication.

Description:

The RAITH150 TWO system is a state-of-the-art EBL machine designed for high-resolution electron beam lithography. This advanced EBL tool enables the creation of ultra-fine patterns at the nanometer scale, far beyond the limits of optical lithography.

Using a precisely controlled e-beam lithography process, a focused electron beam scans across a resist-coated surface, depositing energy to define intricate patterns with sub-10 nm resolution. The system is highly versatile, supporting various resist types, materials, and complex geometries, making it ideal for research in nanotechnology, photonics, and semiconductor fabrication.

With its superior accuracy and flexibility, this electron beam lithography system is a powerful solution for cutting-edge nanofabrication applications.