Evatec BAK501 - Thin Film Deposition System
The Evatec BAK501 is a versatile thin film deposition platform. Widely used by
researchers in the field of nanotechnology, the system combines high precision with flexibility, making it suitable for research, development, and industrial
applications.
The BAK501 enables uniform and reproducible thin film growth, supporting batch
processing of up to five 6-inch silicon wafers simultaneously. Equipped with
advanced control and monitoring tools, it delivers stable processes and accurate
results for a wide range of materials.
Key Features
- 8 electron-beam evaporation sources (E-Gun)
- Closed-loop control for precise and stable deposition
- Real-time thickness monitoring with sub-nanometer resolution
- Deposition with reactive gas introduction for advanced film engineering
- Heating and ion-beam assistance for improved adhesion and crystalline structure
- The BAK501 supports deposition of a wide variety of materials Such as Metal and oxides.




