E-Beam Lithography Raith 150 Ⅰ
Manufacturer and model:
The Raith150 represents a new and innovative generation of electron-beam writers for R&D application and close the gap between the SEM conversions and expensive production equipment. The Raith 150 is capable of a resolution of about 50 nm.
- Ultra-high-resolution Electron Beam Lithography.
- Automated waferscale e-beam writing.
- 30 KV exposure and imaging.
- Thermal shield.
- Unique split room setup.
Nano center building.
Inna Shechtman (email@example.com).
Dolev Roitman (firstname.lastname@example.org).