E-Beam Lithography Raith 150 Ⅰ

E-Beam Lithography Raith 150 Ⅰ
E-Beam Lithography Raith 150 Ⅰ

Manufacturer and model:

RAITH150

 

Description:

The Raith150 represents a new and innovative generation of electron-beam writers for R&D application and close the gap between the SEM conversions and expensive production equipment. The Raith 150 is capable of a resolution of about 50 nm.

 

Specification:

  • Ultra-high-resolution Electron Beam Lithography.
  • Automated waferscale e-beam writing.
  • 30 KV exposure and imaging.
  • Thermal shield.
  • Unique split room setup.


Location:

Nano center building.

 

Tool Owner:

Inna Shechtman (innas@tauex.tau.ac.il).

 

Tool Trainer:

Dolev Roitman (rdolev@gmail.com).

 

Rates & Costs for external Commercial / Industrial:

Tool - 440 NIS / hr

Staff Time - 440 NIS / hr.

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