E-Beam Lithography Raith 150 Ⅰ
Manufacturer and model:
RAITH150
Description:
The Raith150 represents a new and innovative generation of electron-beam writers for R&D application and close the gap between the SEM conversions and expensive production equipment. The Raith 150 is capable of a resolution of about 50 nm.
Specification:
- Ultra-high-resolution Electron Beam Lithography.
- Automated waferscale e-beam writing.
- 30 KV exposure and imaging.
- Thermal shield.
- Unique split room setup.
Location:
Nano center building.
Tool Owner:
Inna Shechtman (innas@tauex.tau.ac.il).
Tool Trainer:
Dolev Roitman (rdolev@gmail.com).