E-Beam Lithography Raith 150 Ⅰ

Manufacturer and model:

RAITH150

Description:

The Raith150 represents a new and innovative generation of electron-beam writers for R&D application and close the gap between the SEM conversions and expensive production equipment. The Raith 150 is capable of a resolution of about 50 nm.

Specification:

• Ultra-high-resolution Electron Beam Lithography.
• Automated waferscale e-beam writing.
• 30 KV exposure and imaging.
• Thermal shield.
• Unique split room setup.

​Location:

Nano center building.

Tool Owner:

Inna Shechtman (innas@tauex.tau.ac.il).

Tool Trainer:

Dolev Roitman (rdolev@gmail.com).