Mask Aligner MA6 GEN4

Manufacturer and model:

KARL SUSS MA/BA6 GEN4 Mask Aligner.

Description:

The SUSS MA/BA6 mask aligner is widely recognized as a benchmark in semiconductor submicron research and microsystems production.

It is designed for all standard lithography applications and wafer sizes of up to 150 mm. For thick-resist MEMS applications, the MA/BA6 offers high resolution and optimum edge quality.

The bottom side alignment option allows for pattern printing on both sides of the substrate.