Mask Aligner MA6 GEN4
- UV LED light source
- Uniformity<2.5%
- Manual & Automatic Wafer Alignment
- Flood exposure, soft, hard, and vacuum contact capable.
- Topside and backside alignment.
- 1 µm feature size. resolution in thin resist.
- Mask size: 4" , 5'" and 7".
- Sample sizes up to 6'' wafers. BSA of small pieces is supported by a glass chuck.
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