Mask Aligner MA6 GEN4

Manufacturer and model:

KARL SUSS MA/BA6 GEN4 Mask Aligner.

Description:

The SUSS MA/BA6 mask aligner (MA) is a high-precision photolithography tool, widely recognized as a benchmark in semiconductor submicron research and microsystems production. This photolithography system delivers exceptional accuracy and versatility for advanced microfabrication.

Designed for all standard lithography applications, the mask aligner (MA) supports wafer sizes of up to 150 mm and enables high-resolution patterning with submicron accuracy. Its precision alignment system ensures exceptional layer-to-layer registration, critical for multi-step fabrication processes.

The system offers advanced illumination options, UV LED light source with adjustable wavelengths to optimize exposure conditions for various resists. Additionally, it supports a wide range of substrates, including silicon, glass, and flexible materials, making it ideal for diverse applications such as MEMS, photonics, and IC packaging.

The bottom-side alignment capability enables precise patterning on both sides of the substrate, a key feature for complex device fabrication.