Diener Plasma (EBL CR)

Diener Plasma (EBL CR)
Diener Plasma (EBL CR)

Manufacturer and model:

Plasma-System-Pico Surface Technology. Electronic Diener.

 

Description:

Device and wafer surface cleaning treatments procedures, removal of organic residuals and native oxides.

 

Specification:

  • Semi automatic control.
  • Generate frequency: 40kHz (standard); 13.56MHz; 2.45GHz.
  • Generator power: 0W-200W for 40kHz, infinitely variable.
  • Process timer.
  • Pirani gauge.
  • Gas Supply: Argon and Oxygen.

 

Location:

Clean Room&E-beam Preparation Room, Nano center building.

 

Tool Owner:

Gidon Jacob (gjacob@tauex.tau.ac.il).

 

Tool Trainer:

Erez Benjamin (erezbenj@mail.tau.ac.il).

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