ALD Beneq

Manufacturer and model:

BENEQ TFS 200.

Description:

Atomic layer deposition is a chemical gas phase thin film deposition method based on sequential, self-saturating surface reactions. Using ALD, compared to sputter or evaporation, enables ultra fine thickness-controlled growth of the desired material by alternatively pulsing the source gases.

For growth of thin conformal layers with thickness control down to atomic precision (~ 3Å).

Materials: 

Pt, AlN, Al2O3, TaN, TiN, ZnO, TiO2, Ta2O5, HfO2 .