Etch
RIE NEXTRALReactive Ion Etch system with a High Density Plasma reactor (HDP).
Erez Benjamin | 03-6409837 | erezbenj@tauex.tau.ac.il
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RIE OerliconA Reactive Ion Etch system with a parallel plate plasma etching, which contributes to an anisotropic thin film etching.
Dr. Boris Yofis | 03-6407718 | boris.yofis@gmail.com
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Deep RIE SLR ICPUnaxis Shuttlelock Deep Reactive Ion Etcher.
Dr. Valery Garber | 03-6405713 | Valeryg@tauex.tau.ac.il
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Deep RIE Versaline DSEDeep Reactive Ion Etcher provides profile control and side wall smoothness.
Erez Benjamin | 03-6409837 | erezbenj@tauex.tau.ac.il
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Ion Beam Milling AJAPhysical etching technique in a vacuum chamber.
Nirit Porecki-Shamay | 03-6404262 | nporecki@tauex.tau.ac.il
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Plasma PreenA microprocessor controlled microwave oven, which produces plasma within a vacuum chamber.
Gidon Jacob| 03-6405303 | gjacob@tauex.tau.ac.il
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Diener Plasma (EBL CR)
Gidon Jacob| 03-6405303 | gjacob@tauex.tau.ac.il
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