KLA P-17 Mechanical Stylus Profilometer

Frequently Asked Questions

What is the KLA P-17 Mechanical Profilometer used for?

The KLA P-17 is used for measuring surface step height, thin film thickness, etch depth, surface roughness, and wafer stress in semiconductor and microfabrication applications.

What is the measurement range of the KLA P-17?
The system measures step heights from nanometers up to 1000 microns (1 mm), depending on configuration.

What industries use the KLA P-17?
The P-17 is commonly used in:

• Semiconductor manufacturing
• MEMS fabrication
• Microelectronics
• Materials science research
• Nanotechnology labs
• University research facilities

What is the stylus force range of the P-17?
The system operates with constant force control from 0.5 mg to 50 mg, allowing measurement of delicate films without damaging the surface.

Can the KLA P-17 measure full wafers?
Yes. The system can scan across the full wafer diameter without stitching, ensuring accurate large-area measurements.

What is the stylus tip radius?

The standard stylus tip radius is 2 microns. Alternative stylus configurations may be available depending on application requirements.

What is the difference between a stylus profilometer and optical profilometer?
A stylus profilometer physically contacts the surface with a diamond tip, making it ideal for step height and structured surface measurements. Optical profilometers are non-contact systems better suited for ultra-soft or highly reflective surfaces.

Is the KLA P-17 suitable for production environments?
Yes. The P-17 offers programmable recipes, motorized stage control, and repeatable measurement performance suitable for both R&D and production process control.