VST Multifunction PVD System
The VST TFDS 6400 is a multifunction Physical Vapor Deposition (PVD) cluster system that combines electron beam evaporation and magnetron sputtering within a single integrated platform.
Featuring two independent process chambers connected by a shared load-lock with automated wafer handling, the system enables sequential deposition processes without breaking vacuum, ensuring excellent film quality, process repeatability, and reduced contamination.
Designed for research and advanced process development, the TFDS 6400 supports the deposition of high-quality metallic and dielectric thin films for a broad range of semiconductor and nanotechnology applications.
The combination of e-beam evaporation and magnetron sputtering in a single platform provides exceptional flexibility for developing multilayer thin-film structures, advanced material stacks, and complex coating architectures, making it an ideal solution for both research and prototype fabrication.
Common Applications:
- Thin film deposition
- Metal and dielectric coatings
- Semiconductor device fabrication
- MEMS fabrication
- Optical coatings
- Nanotechnology research
- Advanced materials development
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