VST Multifunction PVD System

General

• Multifunction PVD cluster tool
• Two independent process chambers
• Shared load-lock with automatic wafer transfer
• 6" water-cooled substrate holder
• Compatible with 4" wafer adapters and smaller samples
• Fully automated PC/PLC control system with graphical HMI

Available Processes

• Electron Beam Evaporation
• DC Magnetron Sputtering
• RF Magnetron Sputtering
• Reactive Sputtering
• Co-Sputtering (simultaneous deposition from two targets)
• Thin Film Deposition of Metals
• Thin Film Deposition of Dielectrics

Magnetron Sputtering Chamber

• Five 3" magnetron sources
• DC and RF power supplies
• Confocal sputtering geometry
• Reactive sputtering with Ar, N₂, and O₂
• Simultaneous co-sputtering from two sources
• Cryogenic vacuum pump

Electron Beam Evaporation Chamber

• Electron beam source with solid-state power supply
• Six 7 cc crucibles
• Digital beam sweep
• Automatic thickness monitoring and control
• Cryogenic vacuum pump