Deposition

Layer deposition techniques at TAU.nano offer precise control over thin film formation, essential for creating high-quality nanostructures and devices with tailored properties

 
 

E-beam Evaporator VST (Nano)

Physical vapor deposition by Electron beam evaporator

 

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E-beam Evaporator VST (Nano)
 
 
 

Magnetron Sputtering Vinci

Physical vapor deposition by plasma-based deposition in which ions are accelerated toward the target.

 

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Magnetron Sputtering Vinci
 
 
 

Magnetron Sputtering PENTA

Physical vapor deposition by plasma-based deposition in which ions are accelerated toward the target.

 

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Magnetron Sputtering PENTA
 
 
 

E-beam Evaporator Vinci

Physical vapor deposition by Electron beam evaporator.

 

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E-beam Evaporator Vinci
 
 
 

PECVD PlasmTherm

Plasma Enhanced Chemical Vapor Deposition.

 

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PECVD PlasmTherm
 
 
 

ALD Beneq

Atomic layer deposition (ALD) is a thin-film deposition technique which is classified as a subclass of chemical vapor deposition.

 

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ALD Beneq
 
 
 

Electroplating Yamamoto

Electroplating is a metal coating process on a metallic sample by an electro-deposition process.

 

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Electroplating Yamamoto
 
 
 

RTP

Rapid thermal processing (RTP) is a process that heats specimens to high temperatures within several seconds or less

 

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RTP
 
 

 

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